The product range includes single-frequency and narrow-linewidth CW DPSS lasers form Skylark lasers and high-reptation Q-switched pulsed lasers from Litron Lasers, suitable for a wide range of laboratory and industrial applications. Skylark Laser provide narrow-linewidth CW DPSS lasers in UV and NIR wavelength, delivering exceptional optical stability and beam quality. Their compact NX UV series offers an efficient and reliable alternative to traditional gas lasers.

Litron Lasers specializes in pulsed and Q-switched Nd:YAG and Nd:YLF systems, offering high pulse energies, robust industrial design and true TEM00 beam performance for applications such as precision processing and Ti:Sapphire pumping. 



Skylark 320 NX

Up to 200 mW output power

UV wavelength

Single longitudinal mode

Linewidth ≤ 0.5 MHz

Skylark 349 NX

Up to 400 mW output power

UV wavelength

Single longitudinal mode

Linewidth ≤ 0.5 MHz

Q-Switched High Rep Rate

LD1053:Up to 30 mJ@1 kHz

LD60-532:Up to 6 mJ@10 kHz

Up to 50 kHz rep rate

Skylark 780 NX

Output power up to 400 mW

NIR wavelength

Single longitudinal mode

Linewidth ≤ 0.3 MHz

ASE noise < – 80 dB

Skylark 785 NX

Output power up to 400 mW

NIR wavelength

Single longitudinal mode

Linewidth ≤ 0.3 MHz

TEM₀₀ spatial mode

High-power DPSS Laser

LD-527: Intra-cavity doubled Nd:YLF

Up to 30 mJ per pulse.

1 kHz repetition rate

527 nm output wavelength

Skylark NX lasers have wide use in UV Raman spectroscopy, Brillouin microscopy, semiconductor defect detection, and wafer inspection applications due to their precision and reliability. Their performance also makes them ideal for characterizing wide band gap materials such as SiC and InGaN for semiconductors, as well as 2D materials such as graphene and MoS2, with application in quantum technologies targeting rubidium or strontium. In nanofabrication, DPSS lasers support interference lithography, diffraction grating fabrication and optical grating mastering. In addition, they are employed as a stable excitation in sensitive optical measurements in laser interferometry and photoluminescence studies. Read more